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题名/责任者:

Photoelasticity : proceedings of the international symposium held at Illinois Institute of Technology / edited by M. M. Frocht.

出版发行项:

New York : Macmillan, 1963.

载体形态项:

xxi, 294 p. : ill., diagrs. ; 24 cm.

会议名称:

International Symposium on Photoelasticity (1961 : Chicago, Ill.)

附加个人名称:

Frocht, Max Mark.

附加团体名称:

Illinois Institute of Technology.

附加团体名称:

United States. Army Research Office.

论题主题:

Photoelasticity-Congresses.

中图法分类号:

O43-53

一般附注:

"Sponsored by U. S. Army Research Office (Durham), National Science Foundation, and Illinois Institute of Technology."

一般附注:

"A Pergamon Press Book."

书目附注:

Includes bibliographical references.

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