机读格式显示(MARC)

• 000 01122cam 2200337 a 4500

• 000 1000081826

• 001 0000305523

• 005 20070201155448.0

• 008 921028s1993 nyua b 001 0 eng

• 010 __ |a 92036072

• 020 __ |a 8122405614 (Wiley Eastern)

• 020 __ |a 0470220635 (J. Wiley) : |c CNY20.00

• 040 __ |a DLC |c DLC |d DLC

• 050 00 |a TK7872.M3 |b P38 1993

• 090 __ |a TN405/TUS

• 093 __ |a TN405 |2 4

• 099 __ |a CAL 022000354876

• 100 1_ |a Tandon, U. S., |d 1952-

• 245 10 |a Patterning of material layers in submicron region / |c U.S. Tandon, W.S. Khokle.

• 260 __ |a New York : |b J. Wiley, |c 1993.

• 300 __ |a xii, 183 p. : |b ill. (some col.) ; |c 25 cm.

• 504 __ |a Includes bibliographical references and index.

• 650 _0 |a Lithography, Electron beam.

• 650 _0 |a X-ray lithography.

• 650 _0 |a Integrated circuits |x Masks.

• 650 _0 |a Ion beam lithograph.

• 700 1_ |a Khokle, W. S.

• 901 __022007000523

• 905 __ |a CAU |f TN405/TUS |b E0210144(or.)

• 907 __ |a CAU |f TN405/TUS |b E0210144(or.)

• 999 __ |t C |A gxr |a 20070201 15:50:03 |I gxr |i 20070201 15:54:48 |G wzhlc |g 20070327 15:06:2